Subjects : RTA process
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Conference | 2012 | Study of Titanium Silicide with Tin Capping Layer Park Jong-Moon 대한전자공학회 종합 학술 대회 (하계) 2012, pp.359-362 | ||
| Journal | 2007 | Er and Pt Gate Electrodes Formed on SiO2 Gate Dielectrics Choi Chel-Jong Electrochemical and Solid-State Letters, v.11, no.2, pp.H22-H25 | 0 | 원문 |
| Journal | 2007 | Thermal Annealing Effects on the Electrical Characteristics of the Back Interface in Nano-silicon-on-insulator Channel 조원주 Applied Physics Letters, v.90, no.14, pp.1-3 | 9 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
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| Type | Year | Research Project | Primary Investigator | Download |
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