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Journal
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2023 |
Effects of Interfacial Electron Transport on Field Electron Emission from Carbon Nanotube Paste Emitters
Kim Jae-Woo ACS Applied Materials & Interfaces, v.15, no.42, pp.49854-49864 |
4 |
원문
|
|
Journal
|
2023 |
Effects of Interfacial Electron Transport on Field Electron Emission from Carbon Nanotube Paste Emitters
Ko Eunsol ACS Applied Materials & Interfaces, v.15, no.42, pp.49854-49864 |
4 |
원문
|
|
Journal
|
2010 |
High-Performance Polycrystalline Silicon TFT on the Structure of a Dopant-Segregated Schottky-Barrier Source/Drain
Choi Sungjin IEEE Electron Device Letters, v.31, no.3, pp.228-230 |
15 |
원문
|
|
Journal
|
2008 |
A Two-step Annealing Process for Ni Silicide Formation in an Ultra-thin Body RF SOI MOSFET
Chang-Geun Ahn Materials Science and Engineering B, v.147, no.2-3, pp.183-186 |
4 |
원문
|
|
Journal
|
2007 |
Thickness Effect of a Ge Interlayer on the Formation of Nickel Silicides
Choi Chel-Jong Journal of the Electrochemical Society, v.154, no.9, pp.H759-H763 |
11 |
원문
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