ETRI-Knowledge Sharing Plaform

4h-Sic Process Conditions Power Device Breakdown Voltage(BDV) High Performance Trench Gate Pin Photodiodes Spectral Range Process Complexity Etch Rates Forming Processes Boron Doping Diffusion Temperature Near-Ir Doping Concentration Silicate Glasses Process Simulation Oxidation Process Fabrication Process Ir Spectral Deep Trench Doping Process Leakage Current CMOS IC Experimental Design Electrical Properties(I-V curve) Electrical Sensing High-Purity High Voltage Ict Convergence Nanoimprint Lithography Power Diode Phase Error Response Time Super-Junction Trench Etching Ultra-Thin Components Technology Etch Selectivity Gas Composition Nano-Sized Trench Power Mosfets Charge Balance Center Wavelength Etch Profile High-Quality Ion Bombardment High-Precision Direct Oxidation 700 V Dental Radiograph Mos Devices Pin Diode Titanium Silicide Uniformly Distributed Dielectric Stability Dc Bias Voltage Nano Resonator Master Mold Annealing Process Boron Diffusion Etching Process Film Thickness Gate Dielectric Integrated Circuit Insertion Loss X-Ray Imaging Cross-Sectional Area(CSA) Process Pressure Plasma Etching Printed Circuit Board(PCB) Promotion Strategy Sic Mosfet Source Power Sio 2 Size Reduction Support Project Inductively-Coupled Plasma(ICP) Oxide Etching Silicon Deep Etching Etching Conditions Flow Rate Glass Doping High Aspect Ratio Process Factors Photo Response Post Oxidation Rf Power Thermal Oxidation 22 Nm Silicon Pixel Detector Wire-Bonded Complementary Metal-Oxide-Semiconductor(CMOS) Arrayed Waveguide Grating(AWG) Fully Depleted(FD) High Temperature Ion Implantation Interface Characteristics N-Type Silicon Recess Gate RF LDMOS Simulation Study Flat-Band Voltage High Resistivity Capacitance-Voltage Block Assembly Compound Semiconductor Process Technology Silicon Substrate Semiconductor Integrated Transverse Electric Human Teeth Micro-Features Patterning Technique Anisotropic Wet Etching Boron Concentration Electrical Characteristics Koh Solution Neural Network Pixel Readout Re-Oxidation Silicon Nitride Reactive Ion Etching(RIE) Triple-Gate Center Point Charge Density Depletion Width Effective Dielectric Flow Ratio Gas Mixture Interface Properties Interface Trap Density Large Area X-Ray Image Lateral Diffusion Mos Capacitor Neuromorphic Hardware Response Characteristics Si Substrate Smart Sensor Thin Structure Imaging Device Memristor Device Polycrystalline Silicon(poly-Si) Si Etching