ETRI-Knowledge Sharing Plaform

4h-Sic Process Conditions High Performance Breakdown Voltage(BDV) Power Device Trench Gate Process Complexity Pin Photodiodes Spectral Range Etch Rates Forming Processes Boron Doping Diffusion Temperature Near-Ir Deep Trench Silicate Glasses Process Simulation Oxidation Process Fabrication Process Ir Spectral Doping Concentration Doping Process Leakage Current Electrical Sensing CMOS IC Components Technology Electrical Properties(I-V curve) Experimental Design Etch Selectivity Gas Composition High Voltage Ict Convergence Nanoimprint Lithography Nano-Sized Power Diode Phase Error Response Time Ultra-Thin Trench Power Mosfets Trench Etching Super-Junction High-Purity Charge Balance Center Wavelength Dc Bias Voltage Dental Radiograph Direct Oxidation Dielectric Stability Etch Profile High-Precision High-Quality Ion Bombardment Master Mold Mos Devices Nano Resonator Pin Diode 700 V Uniformly Distributed Titanium Silicide Annealing Process Boron Diffusion Cross-Sectional Area(CSA) Etching Process Film Thickness Gate Dielectric Inductively-Coupled Plasma(ICP) Insertion Loss Integrated Circuit Oxide Etching Plasma Etching Process Pressure Printed Circuit Board(PCB) Promotion Strategy X-Ray Imaging Silicon Deep Etching Source Power Sio 2 Size Reduction Sic Mosfet Support Project 22 Nm Etching Conditions Flow Rate Glass Doping High Aspect Ratio Photo Response Process Factors Post Oxidation Rf Power Silicon Pixel Detector Thermal Oxidation Arrayed Waveguide Grating(AWG) Complementary Metal-Oxide-Semiconductor(CMOS) Fully Depleted(FD) Flat-Band Voltage High Resistivity High Temperature Interface Characteristics Ion Implantation N-Type Silicon Recess Gate RF LDMOS Wire-Bonded Simulation Study Block Assembly Capacitance-Voltage Compound Semiconductor Human Teeth Micro-Features Neural Networks Patterning Technique Process Technology Silicon Substrate Semiconductor Integrated Transverse Electric Anisotropic Wet Etching Boron Concentration Electrical Characteristics Koh Solution Pixel Readout Re-Oxidation Silicon Nitride Triple-Gate Reactive Ion Etching(RIE) Center Point Charge Density Depletion Width Effective Dielectric Flow Ratio Gas Mixture Interface Properties Interface Trap Density Imaging Device Lateral Diffusion Large Area Mos Capacitor Memristor Device Neuromorphic Hardware Polycrystalline Silicon(poly-Si) Response Characteristics Thin Structure X-Ray Image Si Substrate Si Etching Smart Sensor