Subjects :
Postdeposition annealing (PDA)
논문 검색결과
| Type |
Year |
Title |
Cited |
Download |
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Journal
|
2025 |
Low-temperature hybrid microwave annealing process for high-performance indium–tungsten oxide thin-film transistors
Lim Seonghwan Applied Physics Letters, v.127, no.9, pp.1-7 |
0 |
원문
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|
Journal
|
2025 |
Low-temperature hybrid microwave annealing process for high-performance indium–tungsten oxide thin-film transistors
최현식 Applied Physics Letters, v.127, no.9, pp.1-7 |
0 |
원문
|
|
Journal
|
2010 |
Effects of N2 and NH3 Remote Plasma Nitridation on the Structural and Electrical Characteristics of the HfO2 Gate Dielectrics
Park Kun Sik Applied Surface Science, v.257, no.4, pp.1347-1350 |
37 |
원문
|
|
Journal
|
2008 |
Vanadium Dioxide Films Deposited on Amorphous SiO2- and Al2O3-Coated Si Substrates by Reactive RF-Magnetron Sputter Deposition
Sun Jin Yun Japanese Journal of Applied Physics, v.47, no.4, pp.3067-3069 |
22 |
원문
|
|
Conference
|
2006 |
Electrical Characterization of Semiconducting Nanowire and Its Application to a Chemical Sensor
Kang-Ho Park The Electrochemical Society (ECS) Meeting 2006, pp.231-237 |
0 |
원문
|
특허 검색결과
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연구보고서 검색결과
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