Subjects :
Electron spectroscopy (82.80.Pv)
논문 검색결과
| Type |
Year |
Title |
Cited |
Download |
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Journal
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2015 |
CCQM pilot study CCQM-P140: quantitative surface analysis of multi-element alloy films
김경중 Metrologia, v.52, no.Technical Suppl., pp.1-28 |
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원문
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Journal
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2014 |
The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.15, no.1, pp.49-54 |
1 |
원문
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Journal
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2013 |
Accurate Quantification of Cu(In,Ga)Se2 Films by AES Depth Profiling Analysis
장종식 Applied Surface Science, v.282, pp.777-781 |
8 |
원문
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Journal
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2011 |
Dry Etching of TiN in N2/Cl2/Ar Adaptively Coupled Plasma
Kim Dong -Pyo Vacuum, v.86, no.4, pp.380-385 |
5 |
원문
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Journal
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2010 |
Effects of N2 and NH3 Remote Plasma Nitridation on the Structural and Electrical Characteristics of the HfO2 Gate Dielectrics
Park Kun Sik Applied Surface Science, v.257, no.4, pp.1347-1350 |
37 |
원문
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Journal
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2009 |
Surface Modification of the Polyethyleneimine Layer on Silicone Oxide Film Via UV Radiation
Hong Hyo Bong Applied Surface Science, v.255, no.12, pp.6103-6106 |
15 |
원문
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Journal
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2008 |
Patterning of Conducting Polymers Using Charged Self-Assembled Monolayers
Jeong Mihee Langmuir, v.24, no.17, pp.9825-9831 |
25 |
원문
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Journal
|
2008 |
Effects of Oxygen Concentration on the Electrical Properties of ZnO Films
김홍승 Ceramics International, v.34, no.4, pp.1097-1101 |
30 |
원문
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Conference
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2002 |
The Effects of Plasma Induced Damage on The Channel Layers of Ion Implanted GaAs MESFETs during Reactive Ion Etching(RIE) and Plasma Ashing Processes
Hokyun Ahn Materials Research Society (MRS) Meeting 2002 (Spring), v.720, pp.67-72 |
1 |
원문
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특허 검색결과
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연구보고서 검색결과
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