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Journal
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2025 |
Mitigating hydrogen-related instabilities in oxide thin-film transistor via nitrogen-engineered passivation layer for thermal stability
이이삭 Applied Surface Science Advances, v.29, pp.1-11 |
0 |
원문
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Journal
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2025 |
Mitigating hydrogen-related instabilities in oxide thin-film transistor via nitrogen-engineered passivation layer for thermal stability
Na Jae Won Applied Surface Science Advances, v.29, pp.1-11 |
0 |
원문
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Journal
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2013 |
Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.14, no.4, pp.216-220 |
1 |
원문
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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma
김대희 Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 |
3 |
원문
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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas
장한별 Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 |
3 |
원문
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Journal
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2010 |
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
김문근 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 |
5 |
원문
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