ETRI-Knowledge Sharing Plaform

Acoustic Sensor Micro-Electro-Mechanical System(MEMS) Mems Microphone Open Circuit Capacitive-Type Sensing Material Si Substrate Operating Temperature Sacrificial Layer Gas Concentration Frequency Response Characteristics Sensor Based Zero-Bias High Sensitivity Temperature Coefficient Of Resistance(TCR) Scanning Electron Microscopy(S.E.M.) Fabrication Process Low Power Consumption Gas Response Acoustic Actuator Pull-In Voltage 1/F Noise Piezoelectric Ceramics Nano-Powders Sound Pressure Level Back-Plate Structure-Based Tin Oxide Cmos-Compatible Particle Size Semiconductor Type Laser Scanning Vibrometer Sound Field Detection Techniques Parasitic Capacitance Measurement Range Commercial Products Reference Material Flow Type Stress Reduction Etching Process Detection Limit Active Area Sensing Electrodes Solid Electrolyte Recovery Time Alloy Films Micro-Heater X-Ray Diffraction Analysis Surface Micromachined Mems Displacement Characteristics Sound Quality High Temperature Natural Environment Thick Films Low Frequency Range Infrared Focal Plane Array(IRRPA) Silicon Substrate Residual Stress Proposed Model Micro Gas Sensor Measurement Condition Surface Micromachining Bias Voltage Silicon Film Response Time Energy Conversion Efficiency Sound Wave Mixed Data Reactive Ion Etching(RIE) Lumped Model Stoney Equation Magnetic Resonance(MR) Consumer Electronics Formaldehyde Gas Sensor Resonant Modes Low Noise Equivalent Circuit Modeling Lumped Parameters Sensor Module Damping Effect Gas Measurement Chemical Reaction(Biomimetic) Sensing Membrane Capacitive Humidity Sensor Security Guarantee Inlet Type Vibrational Frequency Real-Time Growth Orientation Magnetic Intensity Security Cases Sound Source Vibrational Displacement Single-Layer Model-Based Gas Detection Dc Bias Amorphous Silicon Infrared Detection Bi-Layer Optimal Transfer Intrusion Detection Technique Numerical Analysis Chip Area Reduction Algorithm Gaussian White Noise Ultrafast Response Sampling Frequency Solid State Complementary Metal-Oxide-Semiconductor(CMOS) Co-Precipitation Method Metal Dopants High Energy Physical Properties Wireless Power Transfer Systems(WPTS's) Nano-Scale Si Film Multi-Layer Sensor Performance Rare Metal Induction Coupling Device Size Capacitance Model Acoustic Radiation Semiconductor Gas Sensor Measurement Time Conventional Model Wireless Sensor Network Applications Ultra-Thin Noise Characteristics Piezoelectric Mems Cmos Compatibility Ultrasonic Energy Measurement Results Nanoimprint Lithography Indoor Environment Plate Anchors O 3 Phase Change Material(PCM) Dry Etching Ultrasonic Transmitter Low Temperature(LT) Creative Technology Vacuum Cavity Screen-Printed Analysis And Simulation Transfer Frequency Real Situation White Noise Signal High Performance Equivalent Circuit Modelling Aluminum-Doped Zinc Oxide Mems Capacitive Microphone Flat Frequency Response Static Wireless Sensor Networks(WSNs) Air-Gap Front-End Isotropic Etching Sno 2 Higher Frequency Extraction Method Monitoring System Audio Frequency Membrane Displacement Numerical Simulations 5 Nm Electrical Energy Thermal Uniformity 2 Khz Bridge Type Intrinsic Capacitance Limited Power Bottom Electrode Layer-By-Layer(LbL) Co Gas Sensor Electrical Properties(I-V curve) Nano-Sized Power Constraint Barrier Materials Output Buffer Metal Carbonates Non-Contact Mass Flow High Response Annealing Effects Piezoelectric Speaker Selectively Etching Deep Rie Dc Power Coplanar Configuration Photolithography Process Crystallite Size Thermal Atomic Layer Deposition Design And Fabrication Uv Nanoimprint 60 Hz Oxygen Gas Electrical Permittivity Planar-Type Fire Detection Deposition Technique Electrical Sensing Measurement System Acoustic Performance Adaptively Coupled Plasma Angle-Resolved X-Ray Photoelectron Spectroscopy(ARXPS) Thin Film Stress Environmental Monitoring Water Droplets Highly Sensitive Absolute Pressure Sensor Heat Spreading Energy Scavenging Change In Resistance Bimorph Cantilever High Detectivity Field Effect Transistors(Substrate temperature) Noise Performance Bluetooth Module Nano Resonator Circular Diaphragm Relative Thickness Large Deformation Micromachining Technique High Power Noise Level Film Stress Measurement Simulated And Measured Results Repeated Measurements Lithium-Ion Batteries(LIBs) Mid-Ir Material Combination Co-Sputtered High Output Impedance Feedback Signal Mean Stress High-Precision Encapsulation Technique Carbon Dioxide Measured Frequency Temperature Range Drop-Coated Lithium Carbonate Pmn-Pt Piezoelectric Single Crystal Alumina Substrate Contact Printing Ion Bombardment Suspended Membrane Co2 Concentration Poly-2 Crystal Structure Capping Layer Durability Improvement Series Connection Annealed Films Normal Operation Crystallization Process Crystalline Structure Passive Radio Frequency Identification(RFID) Monolayer Coating A-Si:H Etching Selectivity Frame Rate Noise Filter Variation Rate Pmn-Pt Single Crystal Grain Size Parallel Polarized Natural Frequency Gas Sensor Applications Metal Oxide Gas Sensors Linear Increase Gravitational Force Room-Temperature Activation Process Sensor Response Input Referred Noise Sensor Bias Etching Technique Thermal Evaporation Warm-Up Monitoring Applications Sensor Design Response Speed Noise Equivalent Temperature Difference Post-Annealing Treatment Geometric Pattern Sensor Chip Applied Physics Volume Effects Square Root Controlled Voltage Source Spectroscopy Analysis Audible Sound Al Electrodes Total Harmonic Distortion Infrared (Ir) Sensor Mechanical Stability Power Management Circuit Experiment And Simulation Atomic Force Microscopy (Afm) Xenon Difluoride Optical Microscopy Printing Technology Self-Assembled Monolayers(SAMs) Silicon Wet Etching Average Roughness Surface Topology Piezoelectric Thin Film Surface Morphology Out-Of-Plane Deformation Heat Treatment Initial Gap Material Parameter Rf Power Low Resistivity Poly(Ethylene-Co-Vinyl Alcohol) Zro 2 Mems Sensor Flow Controller Molar Ratio Thermal Time Constant(TTC) Fundamental Resonant Frequency Reduction Of Graphene Oxide Silicon-Based Resistance Change Radio Frequency Magnetron Sputtering Electro-Mechanical Coupling Coefficient Sensor Node Acoustic Pressure Li-Ion Battery Charging Response And Recovery Buffered Hf Output Performance Semi-Circular Spring Constant Device Fabrication Vibration Characteristics Monolithic Integration Compressive Stress Crystalline State Parallel Connection Wireless Sensor Network (Wsn) Theoretical Calculation Thermal Properties Barrier Layers Sensitivity Model Sputtering Conditions Finite Element Analysis (Fea) Direct Etching As 2 Alkali-Earth Metal Water Condensation Oxygen Flow Rate Lumped Spring-Mass Model Plasma-Enhanced Ald Lower Power New Method Voltage Booster Nitrogen Oxide Parameter K Operating Frequency Fabrication Method Analytical Model Screen Printing Technique X-Ray Diffraction (Xrd) Modal Vibration Bulk Micromachining Saturation Region Nonlinear Response Damping Ratio Si Mems Integrated Impedance High Snr Hydriodic Acid Mechanical Damping Plasma-Enhanced Atomic Layer Deposition Activation Technique Practical Application Surface Water Thermal Cycle Electric Field Method Sound Performance Circuit-Integrated Side-Wall Phase-Change Random Access Memory(PRAM) Current Consumption Signal Processing Oxygen Diffusion Polysilicon Piezoresistors Conventional Methods Film Device Hf Vapor Chemical Stability Acoustic Characteristics Substrate Heating Reference Current Monolithic Integrated Alcohol Gas Sensor Fem Simulation Wide Dynamic Range(WDR) Optical Emission Spectroscopy Rf Magnetron Sputtering Technique Metal Membrane Wet Process Reduced Graphene Oxide(rGO) It Depends Gas Barrier Films Aqueous Solution Reference Electrode Structural Properties Microphone Readout Small-Signal Model Alloy Layer NH 3 Lattice Distortion Fea Simulation Low Sensitivity Interdigitated Electrodes Cantilever Structure Dielectric Oxide Effective Capacitance Frequency Characteristics Positive Feedback Humidity Response Comparative Study Mems Accelerometers Improved Sensitivity Full Scale Spin-Coated Water Wettability Micromachined Sensor Piezoelectric Energy Indium Oxide Electrode Diameter Flat Membrane Small Displacement Optimized Method Sheet Resistance Mems Piezoresistive Pressure Sensor Error Rate Pressure Response Atomic Force Microscope(AFM) Direct Current(DC) Parallel Plate Capacitor Surface Properties Ar Plasma Mass Production Pvdf Film Double Layer Digital Output Lithium Phosphate Voltage Controlled Low Thermal Conductivity Empirical Parameters 20 Hz Moving Ground Vacuum Sealing Low Electrical Resistivity Si-Based Ar Gas Structural Parameters Equivalent Mass Novel Process Tensile Stress Infrared Sensor Data Acquisition Board Readout Integrated Circuit Unique Solution Active Devices Low Annealing Temperature Electrolyte Material Proof Mass Sputtering Power Fabricated Surface Co-Sputtering Method Vapor Etching Xrd Analysis Mems Structure Ubiquitous Sensor Network Offset Voltage Thickness Ratio Capture Module Amplification Technique Different Order Hydrophilic Surface Power Applications Standard Cmos Process As-Deposited Noise Factor Experimental Study Integrated Process Opposite Direction Chemical Vapour Deposition(CVD) Etching Mechanism Surface Characterization Specific Detectivity Personal Computer(PC) Dynamic Responses Process Layer Contact Angle(CA) Rf Mems Capacitive Switch Source Follower Post-Annealed Thermal Decomposition 1 H Low Deposition Temperature Three Components Gas Sensing Properties Low Stress Co2 Sensor Relative Humidity Gas Mixture Hydrophobic Surface Thermal Annealing Low Substrate Temperature Low Input Impedance Relative Displacement Capacitive Mems Accelerometer Ir Absorption Poly(Ethylene Terephthalate) Substrate Front-Side Gas Flow Rate Natural Resonance Frequency Air Damping System Application Low-Cost Thermal Isolation Smart Sensor Response Curves Inkjet Printing Design And Optimization Piezoelectric Membrane Sick Building Syndrome(SBS) Personal Digital Assistant(PDA) Higher Sensitivity Power Supply Gas Sensing Behavior Signal Amplification Electromotive Force (Emf) Scanning Electron Microscope Polyvinylidene Difluoride(PVDF) Inlet Structure H 2 Oxide Film Viscous Resistance Micro-Sensor Standard Deviation(STD) Surface Treatments Plasma-Enhanced Chemical Vapor Deposition (Pecvd) Frequency Response Range