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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma
김대희 Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 |
3 |
원문
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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas
장한별 Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 |
3 |
원문
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Journal
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2011 |
Dry Etching of TiN in N2/Cl2/Ar Adaptively Coupled Plasma
Kim Dong -Pyo Vacuum, v.86, no.4, pp.380-385 |
5 |
원문
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Journal
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2009 |
Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma
한용현 Japanese Journal of Applied Physics, v.48, no.8, pp.08HD041-08HD045 |
8 |
원문
|
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Journal
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2008 |
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl2/X (X=Ar, He, N2) Inductively Coupled Plasmas
Alexander Efremov Journal of the Electrochemical Society, v.155, no.12, pp.D777-D782 |
72 |
원문
|
|
Journal
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2006 |
Dry Etching of Ge2Sb2Te5 Thin Films into Nanosized Patterns Using TiN Hard Mask
Yoon Sung Min Japanese Journal of Applied Physics, v.45, no.40, pp.1080-1083 |
21 |
원문
|