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Journal
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2014 |
Surface Properties of ZrO2 Thin Film Under Cl2/Ar Plasma Using Angle-Resolved X-Ray Photoelectron Spectroscopy
Woo Jong Chang Japanese Journal of Applied Physics, v.53, no.8S3, pp.1-6 |
3 |
원문
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Journal
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2013 |
Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.14, no.4, pp.216-220 |
1 |
원문
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Journal
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2013 |
The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.14, no.2, pp.67-70 |
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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma
김대희 Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 |
3 |
원문
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Journal
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2011 |
Dry Etching of TiN in N2/Cl2/Ar Adaptively Coupled Plasma
Kim Dong -Pyo Vacuum, v.86, no.4, pp.380-385 |
5 |
원문
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Journal
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2010 |
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
김문근 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 |
5 |
원문
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Journal
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2009 |
Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma
한용현 Japanese Journal of Applied Physics, v.48, no.8, pp.08HD041-08HD045 |
8 |
원문
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Journal
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2008 |
Model-Based Analysis of the ZrO2 Etching Mechanism in Inductively Coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas
김만수 ETRI Journal, v.30, no.3, pp.383-393 |
10 |
원문
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Journal
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2008 |
Etching Characteristics of Al2O3 Thin Films in Inductively Coupled BCl3/Ar Plasma
Sun Jin Yun Vacuum, v.82, no.11, pp.1198-1202 |
14 |
원문
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