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Journal
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2018 |
Deposition Pressure Dependent Electric Properties of (Hf, Zr)O2 Thin Films Made by RF Sputtering Deposition Method
Moon Seungeon Journal of the Korean Physical Society, v.73, no.11, pp.1712-1715 |
0 |
원문
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Conference
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2017 |
Investigation of Compositional Variation across Zn(O,S) Thin Films prepared by RF Sputtering for Photovoltaic Applications
Cho Daehyung 한국태양광발전학회 학술 대회 (추계) 2017, pp.1-1 |
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Journal
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2013 |
Effect of Silicide/Silicon Hetero-Junction Structure on Thermal Conductivity and Seebeck Coefficient
Choi Won Chul Journal of Nanoscience and Nanotechnology, v.13, no.12, pp.7801-7805 |
6 |
원문
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Journal
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2011 |
Effects of the Composition of Sputtering Target on the Stability of InGaZnO Thin Film Transistor
허준영 Thin Solid Films, v.519, no.20, pp.6868-6871 |
38 |
원문
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Journal
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2009 |
High performance thin film transistor with cosputtered amorphous Zn–In–Sn–O channel: Combinatorial approach
Ryu Min Ki Applied Physics Letters, v.95, no.7, pp.072104-1-072104-3 |
119 |
원문
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Journal
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2002 |
Electrochemical Properties of Vanadium Oxide Thin Film Deposited by R.F. Sputtering
Park Yong-Joon Solid State Ionics, v.154-155, pp.229-235 |
38 |
원문
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