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Journal
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2018 |
DC and RF Characteristics of Enhancement-Mode Al2O3/AlGaN/GaN MIS-HEMTs Fabricated by Shallow Recess Combined with Fluorine-Treatment and Deep Recess
Jung Hyunwook ECS Journal of Solid State Science and Technology, v.7, no.4, pp.197-200 |
3 |
원문
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Journal
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2012 |
Nano-Scale Texturing of Borosilicate Glasses Using CF4-Based Plasma Discharge for Application in Thin film Solar Cells
김형수 Journal of Nanoscience and Nanotechnology, v.12, no.4, pp.3464-3468 |
4 |
원문
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Journal
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2011 |
Analysis of Etching Mechanism and Etched Slope Control of Silicon for Nanoimprinting Lithography
함용현 Journal of Nanoscience and Nanotechnology, v.11, no.7, pp.6523-6527 |
0 |
원문
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|
Conference
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2009 |
Study on the Surface Characteristics of Parylene-C Films in Inductively Coupled O2/CF4 Gas Plasma
Ham Yong-Hyun International Meeting on Information Display (IMID) 2009, pp.1399-1401 |
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|
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Journal
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2006 |
Dry Etching of Ge2Sb2Te5 Thin Films into Nanosized Patterns Using TiN Hard Mask
Yoon Sung Min Japanese Journal of Applied Physics, v.45, no.40, pp.1080-1083 |
21 |
원문
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