Subjects :
ion bombardment
논문 검색결과
| Type |
Year |
Title |
Cited |
Download |
|
Journal
|
2025 |
Highly Enhanced Light Recycling in Quantum Dot Displays by Sidewall Reflectors
장재동 ADVANCED OPTICAL MATERIALS, v.13, no.5, pp.1-8 |
7 |
원문
|
|
Journal
|
2025 |
Highly Enhanced Light Recycling in Quantum Dot Displays by Sidewall Reflectors
Hyunsu Cho ADVANCED OPTICAL MATERIALS, v.13, no.5, pp.1-8 |
7 |
원문
|
|
Journal
|
2024 |
Effect of inductively coupled plasma etch on the interface barrier behavior of (001) β-Ga2O3 Schottky barrier diode
Lee Hun Ki JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.42, no.4, pp.1-10 |
2 |
원문
|
|
Conference
|
2018 |
Field Emission Performance of Boron Nitride Nanotube Emitters According to Vacuum Pressure
Ki Nam Yun International Vacuum Nanoelectronics Conference (IVNC) 2018, pp.1-2 |
0 |
원문
|
|
Journal
|
2014 |
Surface Properties of ZrO2 Thin Film Under Cl2/Ar Plasma Using Angle-Resolved X-Ray Photoelectron Spectroscopy
Woo Jong Chang Japanese Journal of Applied Physics, v.53, no.8S3, pp.1-6 |
3 |
원문
|
|
Journal
|
2014 |
The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.15, no.1, pp.49-54 |
1 |
원문
|
|
Journal
|
2013 |
Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.14, no.4, pp.216-220 |
1 |
원문
|
|
Journal
|
2002 |
Characterization of Via Etching in CHF3/CF4 Magnetically Enhanced Reactive Ion Etching Using Neural Networks
Kwon Sung-Ku ETRI Journal, v.24, no.3, pp.211-220 |
10 |
원문
|
특허 검색결과
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Family Pat. |
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연구보고서 검색결과
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