|
Journal
|
2021 |
Analysis and Validation of Cross-Modal Generative Adversarial Network for Sensory Substitution
Kim Moo Seop International Journal of Environmental Research and Public Health, v.18, no.12, pp.1-22 |
6 |
원문
|
|
Conference
|
2019 |
Hidden Markov Model based Analysis on the MCS Index of LTE using PDCCH Measurement Data
Yunbae Kim International Conference on Ubiquitous and Future Networks (ICUFN) 2019, pp.333-335 |
1 |
원문
|
|
Journal
|
2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma
김대희 Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 |
3 |
원문
|
|
Journal
|
2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas
장한별 Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 |
3 |
원문
|
|
Journal
|
2010 |
Circuit-Model-Based Analysis of a Wireless Energy-Transfer System via Coupled Magnetic Resonances
Cheon Sang Hoon IEEE Transactions on Industrial Electronics, v.58, no.7, pp.2906-2914 |
434 |
원문
|
|
Journal
|
2010 |
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
김문근 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 |
5 |
원문
|
|
Journal
|
2009 |
Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma
한용현 Japanese Journal of Applied Physics, v.48, no.8, pp.08HD041-08HD045 |
8 |
원문
|
|
Conference
|
2008 |
LACONIC: History-Based Code Dissemination in Programmable Wireless Sensor Networks
Seungki Hong International Conference on Mobile Ad-hoc and Sensor Networks (MSN) 2008, pp.234-241 |
1 |
원문
|
|
Journal
|
2008 |
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl2/X (X=Ar, He, N2) Inductively Coupled Plasmas
Alexander Efremov Journal of the Electrochemical Society, v.155, no.12, pp.D777-D782 |
72 |
원문
|
|
Journal
|
2008 |
Model-Based Analysis of the ZrO2 Etching Mechanism in Inductively Coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas
김만수 ETRI Journal, v.30, no.3, pp.383-393 |
10 |
원문
|
|
Journal
|
2008 |
Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3∕He inductively coupled plasma
김만수 Journal of Vacuum Science and Technology A, v.26, no.3, pp.344-351 |
14 |
원문
|