Subjects :
Etched surface
논문 검색결과
| Type |
Year |
Title |
Cited |
Download |
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Journal
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2024 |
Effect of inductively coupled plasma etch on the interface barrier behavior of (001) β-Ga2O3 Schottky barrier diode
Lee Hun Ki JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.42, no.4, pp.1-10 |
2 |
원문
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Journal
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2014 |
The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.15, no.1, pp.49-54 |
1 |
원문
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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma
김대희 Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 |
3 |
원문
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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas
장한별 Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 |
3 |
원문
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Journal
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2011 |
Etching characteristics and mechanism of Ga-doped ZnO thin films in inductively-coupled HBr/X (X = Ar, He, N2, O2) plasmas
함용현 Vacuum, v.85, no.11, pp.1021-1025 |
10 |
원문
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Journal
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2009 |
Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma
한용현 Japanese Journal of Applied Physics, v.48, no.8, pp.08HD041-08HD045 |
8 |
원문
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특허 검색결과
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Family Pat. |
KIPRIS |
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연구보고서 검색결과
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