Subject

Subjects : Etching characteristics

  • Articles (8)
  • Patents (0)
  • R&D Reports (0)
논문 검색결과
Type Year Title Cited Download
Journal 2013 Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma   Woo Jong Chang  Transactions on Electrical and Electronic Materials, v.14, no.4, pp.216-220 1 원문
Journal 2012 Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma   김대희  Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 3 원문
Journal 2012 Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas   장한별  Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 3 원문
Journal 2011 Etching characteristics and mechanism of Ga-doped ZnO thin films in inductively-coupled HBr/X (X = Ar, He, N2, O2) plasmas   함용현  Vacuum, v.85, no.11, pp.1021-1025 10 원문
Journal 2010 Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma   함용현  Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-5 5 원문
Journal 2009 Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma   한용현  Japanese Journal of Applied Physics, v.48, no.8, pp.08HD041-08HD045 8 원문
Journal 2008 Etching Characteristics of Al2O3 Thin Films in Inductively Coupled BCl3/Ar Plasma   Sun Jin Yun  Vacuum, v.82, no.11, pp.1198-1202 14 원문
Journal 2005 Etching Characteristics of Ge2Sb2Te5 Using High-Density Helicon Plasma for the Nonvolatile Phase-Change Memory Applications   Yoon Sung Min  Japanese Journal of Applied Physics, v.44, no.24-27, pp.L869-L872 36 원문
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