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Journal
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2015 |
Effect of Inductively Coupled Plasma on the Structural and Electrical Properties of Ti-Doped ITO Films Formed by IPVD
Hong Chan-Hwa Journal of Nanoscience and Nanotechnology, v.15, no.10, pp.8099-8102 |
2 |
원문
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Conference
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2012 |
Effect of ICP power on the electrical & optical properties of Ti-doped ITO films formed by ionized physical vapor deposition method
International Conference on Microelectronics and Plasma Technology (ICMAP) 2012, pp.1-1 |
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Journal
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2012 |
Characteristics of Ti-Doped ITO Films Grown by DC Magnetron Sputtering
Chung Sung Mook Ceramics International, v.38, no.SUPPL. 1, pp.S617-S621 |
20 |
원문
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Conference
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2009 |
Opto-Electrical Properties of Ti-Doped ITO Films Prepared by DC Magnetron Sputtering
Chung Sung Mook International Symposium on Electroceramics (ISE) 2009, pp.1-1 |
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|
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Conference
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2009 |
Fabrication and Characterization of Ti-Doped I TO f Ilms Deposited by DC Magnetron Sputtering
Chung Sung Mook International Conference on Microwave and Photonics (ICMAP) 2009, pp.1-9 |
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Journal
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2008 |
Characteristics of W- and Ti-Doped VO2 Thin Films Prepared by Sol-Gel Method
Chae Byung Gyu Electrochemical and Solid-State Letters, v.11, no.6, pp.D53-D55 |
58 |
원문
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