ETRI-Knowledge Sharing Plaform

Thin Film Solar Cells Silicon Quantum Dots Cigs Solar Cell Cigs Film Soda Lime Glass(SLG) Optical Transmittance Silicon Nanocrystals(Si NCs) Room-Temperature Power Conversion Efficiency Solar Cell Performance I-Zno Organic Light-Emitting Diodes(OLEDS) Contact Resistance(73.40.Cg) Petri Net(PN) Silver Nanowires(AgNWs) Silicon Nitride Film Plasma-Enhanced Chemical Vapor Deposition(PECVD) Zno Thin Films Light Extraction Efficiency Glass Substrate Light-Emitting Diodes (Leds) Si Qds Si Substrate Power Density Series Resistance Crystal Orientation Quantum-Dot Light-Emitting Diodes(QLEDs) Cds Buffer Layer Fabrication Process Ito Thin Film Highly Stretchable External Quantum Efficiency Ito Film Ionized Physical Vapor Deposition(IPVD) Stainless Steel Substrate Touch Screen Panel(TSP) Fill Factor Light Output Power(Lop) Gate Insulator Si Quantum Dot Ferroelectric Memory Field-Effect Mobility New Method Metal Grids Azo Film Current Spreading Layer(CSL) Absorption Layer Poly (Ethylene Glycol)(PEG) Solar Cell Efficiency 20 Nm Alignment Method Electro Luminescence Aqueous Solution Best Performance Reactive Sputtering Process Zno Nanowalls Active Layer First Stokes(S1) Optical Performance Basic Research Ito Contact Nitrogen Source High Reliability Active Devices Transparent Electrode Current On-Off Ratio Metal Interconnects Elastomer Substrate Quantum Confinement Effects Gas Mixture Thermal Annealing Metal-Insulator-Semiconductor Structures Surface Energy Film Composition Commercial Devices 48 V Composition Ratio Lift-Off Nanowire Electrodes Surface Pattern 42 V Large Strains 40 Nm Indium Tin Oxide Electrodes Electronic Systems Eutectic Gallium-Indium Si Led Cellulose Nanocrystal(CNC) Silver Nanoparticle(AgNP) Pulse Laser Deposition Silicon Nanowires(SiNWs) Electrical Performance Organic Ferroelectric Light Emitter Field Effect Transistors(Substrate temperature) Window Layer Two-Step Au Catalyst Nonvolatile Memory Devices Polyimide Island Hybrid Substrate High-Resolution Transmission Electron Microscopy Forward Voltage Effect Of Annealing 5 Nm Stretchable Electrode Applied Physics Elastomeric Substrate Chemical Bath Deposition(CBD) Silicon Photonics X-Ray Diffraction Analysis Flow Rate Metal Layer Si Wafer As-Grown Hybrid Structure Surface Roughness Interface Quality Monolithically Integrated Oxide Tfts Zno Surface Al Contents Synchrotron X-Ray Scattering Film Deposition Negative Differential Resistance(NDR) Peak Position Vinylidene Fluoride-Co-Hexafluoropropylene(Poly) Process Temperature Intermediate Phase Deposition Conditions Intrinsic Zno Specific Surface Flower Like J-V Characteristics Luminous Efficiency Line Width Cellulose Paper Wrinkled Surface Self-Diagnosis Ti-Doped Ito Gas Flow Touch Sensor Low Temperature Fabrication Mechanical Compression Annealing Effects Sensing Film Elastomer Composite Device Structure X-Ray Powder Diffraction Doping Effects Potential Well Quantum Dot Formation Surface Profile Electronic Control Tunneling Barrier Direct Bandgap Simple Process N-Type Transmission Gate(TG) Each Region Structural Characterization(Microstructure) Poly(Vinylidene Fluoride-Co-Trifluoroethylene) Propylene Glycol Chemically Cross-Linked Sensor Sensitivity P-N Junction Cancer Diagnostic Highly Integrated Circuits Transparent Oxide Semiconductor Surface Cleaning Potassium Iodide Reactive Co-Sputtering Diffraction Peaks Out-Diffusion Irradiation Power Improved Crystallinity Diode Current Need For Saturation Current Density Carrier Transport Metal Fiber Networks Low Temperature Processing Ar Flow Low Threshold Voltage Co-Sputtered Conducting Materials Master Mold Peak-To-Valley Absorbing Layer Surface Acoustic Wave (Saw) Device Si Nanocrystal Forward Current Gan Led High Performance Nanowall Networks Optical And Structural Properties Electrical Characterization Aligned Fibers Metal Contact Amorphous Ingazno Growth And Characterization Plasma Power Self-Assembled Initialization Vector(IV) In-Situ Crystallization Inductively Coupled Plasma Reactor STRETCHABLE ELECTRONICS Solution Treatment Low Operating Voltage Carrier Injection Silicon Carbon Nitride Device Physics Plasma Treatment Photo-Acoustic Crystalline Silicon Cellulose Fibers Emission Image Plasma Density Ordered Defect Compound(ODC) Crystal Grain Size Amorphous Sicn Films Highly Efficient Sputtering Rates Sio 2 Line Pitch Experimental Data Tunneling Device Efficiency Droop Ingan/Gan Multiple Quantum Well Led Applications Surface Reaction Surface-Modified Optimum Condition Mini-Modules Cigs Thin Film Solar Cell Mechanical Deformations Transparent Conducting Films Pentacene Thin-Film Transistors Uniform Array Scattering Experiments Mixing Ratio Electronic Skins New Approach Rf Sputter Matching Layer Carbon Nitride Films Mechanical Stability Post-Annealing Process Ito Electrode Transparent Conducting Oxide(TCO) Current-Voltage Curves Chemically Strengthened Glass Spatial And Temporal Hot Plate Surface Morphological Mesh Pattern Photocurrent Density Co-Evaporation Diagnostic System Three Dimensional(3D) Re-Sputtering Average Roughness Solar Cell Devices Bio-Detection Si Source Surface Reflection Glucose Analysis Zinc Sulfate Building-Integrated Photovoltaic Systems(BIPV) Nanowire Film Optical And Electrical Properties Morphological Properties Low Power Consumption Self-Formed Cd-Free Work Function Raman Spectroscopy Oxide Thin-Film Transistors Alloy Target Large Area Devices Carrier Concentration Rf Power Nucleation Sites Radio Frequency (Rf) Magnetron Sputtering Electro-Optical Properties(E-O) Environmental Problems Voltage Characteristics Current-Voltage Measurements P-Gan Sputter Deposition Cigs Absorber Layer Acidic Hydrolysis Silicon-Based Synthesis And Properties Radio Frequency Magnetron Sputtering Optical Interferometer Rigid Substrate Flexible And Transparent Stretchable Substrate Small Grain Size Dc Sputter Peak Voltage High Transmittance Sub-Micron Solid-State Switch Oxygen Pressure Cu-Contamination Wearable Electronics Short Circuit Current Density Cds Thin Films Air Environment Chemical Doping Enhanced Mobility Epitaxial Growth Post-Annealing Effect Auger Depth Profiling Non-Invasive Control Method Stokes Shift Photovoltaic Devices C-Axis Orientation Electrically Driven High Efficiency Ideal Diode Icp Power High-Pressure Homogenization Continuous Domain Rear Surface Growth Mechanism Light Outcoupling Fabrication And Characterization Surface Acoustic Wave Device Key Factor Vdf-Trfe Fast Response Time Back Electrode Voltage Sweep Electrical And Optical Properties Visible Range Low Sheet Resistance One-Dimensional Structures Growth Temperature Light Distribution Selenization Process Well-Aligned Diffuse Light Mechanical Stretching X-Ray Diffraction (Xrd) Nanocrystalline Zno Blue Light-Emitting Diodes Molecular Nitrogen Cooling Water Nano-Roughened Shunt Resistance Silicon Wafer Sin X Green Approach Parallel-Aligned Metal Catalyst Composition Analysis Simple Method Surface Reflectance Device Properties Epitaxial Relation Surface Modification Photoelectric Conversion Efficiency Plastic Substrate Transparent Contact Layer Controlled Growth Frequency Range Catalytic Metal Visible Spectrophotometry Alternating Current(AC) Sn-Doped Zno Reactive Rf Magnetron Sputter Crystal Phases Light Sources Resonant Tunneling Aluminum-Doped Zinc Oxide Thin Films Device Performance Chemical Vapor Deposition Method Theoretical Model Water-Soluble Wearable Device Open Circuit Voltage(VOC) Elastic Modulus Quartz Tube Post-Deposition Treatment Human-Machine Interaction(HMI) Indium Tin Oxide Thin Films Patterning Technique Energy Dispersive X-Ray Spectroscopy(EDX) Cds Film Ultraviolet-Visible Absorption Spectroscopy Angle Control Quantum Dot Film Capacitive Touch Screen Surface Texturing Effective Area Alignment Precision Flat Panel Display(FPD) Natural Polymer Metallic Crystal Electrospun Fibers Potassium Ions Low Sensitivity Initial Growth Two-Dimensional(2D) X-Ray Fluorescence Comparative Study Cigs Layer Spin-Coated Two-Diode Model Thin-Film Cds Solution-Processable Nickel Silicide Polymer Substrate Period Ratio Hysteresis Curve Low Resistance Sic Film Single-Crystalline Pixel Density Energy-Dispersive X-Ray Spectrometry(EDXS) Microfluidic Device Oxide Layer Dc Magnetron Sputtering White Light Emission Roll-To-Roll Top Layer Potential Applications Na-Doped Mo High Crystallinity Mechanical And Thermal Properties Field Emission Scanning Electron Microscopy(FESEM) Metal Films Hydrophilic Film Film Growth Rate Transfer-Free Visible Region Liquid Metal Alloy Low Electrical Resistivity Barrier Width Films By Pulsed Laser Deposition Voltage Level Resonant Frequency(Fr) Electrical Characteristics Structural And Electrical Properties One-Step Au Layer Tin Oxide Films Gan-Based Leds Hole Tunneling Cu-Poor Ga-Doped Zno Chalcopyrite Structure Preferential Growth Metallic Targets Thickness Effect Thickness Ratio Nc-Si Electron-Hole Recombination Short Wavelength Rigid Materials Nh3 Plasma Atomic Concentration Nanofibrillated Cellulose(NFC) Gas Treatment As-Deposited Raman Measurements Chemical Vapour Deposition(CVD) Reactive Gas Hybrid Films P-Type Secondary Ion Mass Spectroscopy(SIMS) Saw Devices Co-Evaporated Characteristic Parameters Atmospheric Pressure Contact Angle(CA) Recombination Centers Photoluminescence And Hall Measurements Temperature-Controlled Stretchable Film Vacuum Filtration Electrode Materials Hydrogen-Sensing Properties Nanostructured Cds Amorphous Silicon Carbide High-Resolution X-Ray Diffraction Membrane Filter Sapphire Substrates Hydrophobic Surface Precursor Layer Target-To-Substrate Distance Zno Films Semiconductor Materials Organic Thin-Film Transistors Wavelength Range Ultrathin Film Dielectric Layer Near-Field Electrospinning(NFES) Cu-Rich Cyclic Deformation Argon Gas Electric Field Metal Alloys N-Zno Coupling Medium Super-Resolution Imaging Al Thin Films Real-Time Diagnosis Insulating Substrate Gas Source Valley Current New Device Zns Phosphor Preferential Orientation Treatment Conditions Elastic Film Hexagonal Structure Pressure Distribution Liquid Phase Compositional Variation Chemical Sensors Applied Voltage H 2 Highly Transparent Diffusion Barrier(DB) Doping Concentration Pattern Size Silicon Precursor Electron Diffraction Pattern Phase Structure Improved Performance Optoelectronic Integrated Post-Fabrication Chemical Reaction(Biomimetic)