Subjects :
Plasma-enhanced chemical vapor deposition (pecvd)
논문 검색결과
| Type |
Year |
Title |
Cited |
Download |
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Journal
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2021 |
Organic/Inorganic Hybrid Thin-Film Encapsulation Using Inkjet Printing and PEALD for Industrial Large-Area Process Suitability and Flexible OLED Application
Kwon Byoung-Hwa ACS Applied Materials & Interfaces, v.13, no.46, pp.54621-55766 |
48 |
원문
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Conference
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2015 |
The Highly Stable InGaZnO TFTs Deposited by High Density Plasma Sputtering
Cho Sung Haeng International Thin-Film Transistor Conference (ITC) 2015, pp.17-18 |
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Journal
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2013 |
Effect of Hydrogen Plasma Treatment on Nano-Structured TiO2 Films for the Enhanced Performance of Dye-Sensitized Solar Cell
김형진 Applied Surface Science, v.274, pp.171-175 |
43 |
원문
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Journal
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2010 |
Fabrication of a Nanosize Pattern Embedded Plastic Chip via an Injection Molding Method for Application to an Optical Biosensor
Kim Kyung Hyun International Polymer Processing, v.25, no.5, pp.341-345 |
2 |
원문
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Journal
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2009 |
Evaluation of 1/f Noise Characteristics for Si-Based Infrared Detection Materials
Ryu Hojun ETRI Journal, v.31, no.6, pp.703-708 |
3 |
원문
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Journal
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2006 |
Fabrication and Characteristics of 0.12 μm Single and Double-Recessed Gate AlGaAs/InGaAs/GaAs PHEMTs Using a SiNx Pre-Passivation Layer
Jong-Won Lim Journal of the Korean Physical Society, v.49, no.3, pp.S774-S779 |
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Journal
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2006 |
Comparative Study of DC and Microwave Characteristics of 0.12 µm Double-Recessed Gate AlGaAs/InGaAs/GaAs Pseudomorphic High-Electron-Mobility Transistors Using Dielectric-Assisted Process
Jong-Won Lim Japanese Journal of Applied Physics, v.45, no.4B, pp.3358-3363 |
0 |
원문
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Conference
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2006 |
Fabrication and Characteristics of 0.12 μm Single and Double-Recessed Gate AlGaAs/InGaAs/GaAs PHEMTs Using a SiNx Pre-Passivation Layer
Jong-Won Lim 한국반도체 학술 대회 (KCS) 2006, pp.1-2 |
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Journal
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2004 |
Surface micromachined thermally driven micropump
Jang Won Ick Sensors and Actuators A : Physical, v.115, no.1, pp.151-158 |
21 |
원문
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Journal
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1998 |
High-Quality Conformal Silicon Oxide Films Prepared by Multi-Step Sputtering PECVD and Chemical Mechanical Polishing
Min Park Journal of Electronic Materials, v.27, no.11, pp.1262-1267 |
9 |
원문
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특허 검색결과
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연구보고서 검색결과
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