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Journal
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2025 |
The morphological control of PEDOT:PSS top electrode for transparent organic light-emitting diodes
Hyunsu Cho Journal of Industrial and Engineering Chemistry, v.권호미정, pp.1-10 |
0 |
원문
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Journal
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2025 |
The morphological control of PEDOT:PSS top electrode for transparent organic light-emitting diodes
남혁진 Journal of Industrial and Engineering Chemistry, v.권호미정, pp.1-10 |
0 |
원문
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Journal
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2024 |
Optimal hole extraction performance in MoOx-incorporated PEDOT:PSS films for organic photovoltaics
Hwang Tae-Ha Journal of the Korean Physical Society, v.84, no.5, pp.351-355 |
0 |
원문
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Journal
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2024 |
Optimal hole extraction performance in MoOx-incorporated PEDOT:PSS films for organic photovoltaics
곽동훈 Journal of the Korean Physical Society, v.84, no.5, pp.351-355 |
0 |
원문
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Journal
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2021 |
Optimizing Oxide Mixing Ratio for Achieving Energy‐Efficient Oxide Thin‐Film Transistors
Jaehyun Moon Physica Status Solidi (A) - Applications and Materials Science, v.218, no.16, pp.1-5 |
1 |
원문
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Journal
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2014 |
The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.15, no.1, pp.49-54 |
1 |
원문
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Journal
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2012 |
Controlled Charge Transport by Polymer Blend Dielectrics in Top-Gate Organic Field-Effect Transistors for Low-Voltage-Operating Complementary Circuits
Kang-Jun Baeg ACS Applied Materials & Interfaces, v.4, no.11, pp.6176-6184 |
82 |
원문
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Journal
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2012 |
Novel Bumping and Underfill Technologies for 3D IC integration
성기준 ETRI Journal, v.34, no.5, pp.706-712 |
30 |
원문
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Journal
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2012 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas
장한별 Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 |
3 |
원문
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Journal
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2011 |
Dry Etching of TiN in N2/Cl2/Ar Adaptively Coupled Plasma
Kim Dong -Pyo Vacuum, v.86, no.4, pp.380-385 |
5 |
원문
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Journal
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2010 |
Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma
함용현 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-5 |
5 |
원문
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Journal
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2010 |
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
김문근 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 |
5 |
원문
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Journal
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2008 |
Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl2/X (X=Ar, He, N2) Inductively Coupled Plasmas
Alexander Efremov Journal of the Electrochemical Society, v.155, no.12, pp.D777-D782 |
72 |
원문
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Journal
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2008 |
Model-Based Analysis of the ZrO2 Etching Mechanism in Inductively Coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas
김만수 ETRI Journal, v.30, no.3, pp.383-393 |
10 |
원문
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Journal
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2008 |
Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3∕He inductively coupled plasma
김만수 Journal of Vacuum Science and Technology A, v.26, no.3, pp.344-351 |
14 |
원문
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Journal
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2006 |
Adsorption Behavior of Binary Mixed Alkanethiol Molecules on Au: Scanning Tunneling Microscope and Linear-Scan Voltammetry Investigation
김용관 Applied Surface Science, v.252, no.14, pp.4951-4956 |
14 |
원문
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Journal
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2005 |
Etching Characteristics of Ge2Sb2Te5 Using High-Density Helicon Plasma for the Nonvolatile Phase-Change Memory Applications
Yoon Sung Min Japanese Journal of Applied Physics, v.44, no.24-27, pp.L869-L872 |
36 |
원문
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Journal
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2004 |
Amorphous Silicon Carbon Nitride Films Grown by the Pulsed Laser Deposition of a SiC-Si3N4 Mixed Target
Rae-Man Park ETRI Journal, v.26, no.3, pp.257-261 |
12 |
원문
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