Subjects :
Sputtering method
논문 검색결과
| Type |
Year |
Title |
Cited |
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Journal
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2020 |
Reactively Sputtered Zn(O,S) Buffer Layers for Controlling Band Alignment of Cu(In,Ga)Se2 Thin-film Solar Cell Interface
Cho Daehyung Journal of Alloys and Compounds, v.842, pp.1-6 |
25 |
원문
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Conference
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2017 |
P‐10: High‐Density Plasma Sputtered InZnSnO Thin‐Film Transistors Fabricated by Back Channel Etching Method on Flexible Polyimide Substrate
Cho Sung Haeng Society for Information Display (SID) International Symposium 2017, pp.1262-1264 |
6 |
원문
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Conference
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2015 |
The Highly Stable InGaZnO TFTs Deposited by High Density Plasma Sputtering
Cho Sung Haeng International Thin-Film Transistor Conference (ITC) 2015, pp.17-18 |
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Journal
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2013 |
The Characteristics of Cu2O Thin Films Deposited Using RF-Magnetron Sputtering Method with Nitrogen-Ambient
Lee Seong Hyun ETRI Journal, v.35, no.6, pp.1156-1159 |
27 |
원문
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Journal
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2009 |
The Characterization of the Si1-xSbx Thin Films for iIfrared Microbolometer
이동근 반도체 및 디스플레이장비학회지, v.8, no.3, pp.13-17 |
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Journal
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2009 |
High performance thin film transistor with cosputtered amorphous Zn–In–Sn–O channel: Combinatorial approach
Ryu Min Ki Applied Physics Letters, v.95, no.7, pp.072104-1-072104-3 |
119 |
원문
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Journal
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2009 |
Metal-Doped Oxide Electrodes for Transparent Thin-Film Transistors Fabricated by Direct Co-Sputtering Method
Cheong Woo-Seok Japanese Journal of Applied Physics, v.48, no.4, pp.04C089-1-04C089-5 |
0 |
원문
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Journal
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2008 |
Process compatible silicon–germanium–antimony heating layer for high density phase-change memory applications
Lee Seung-Yun Microelectronic Engineering, v.85, no.12, pp.2342-2345 |
5 |
원문
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Journal
|
2007 |
Enhancement of Luminance Characteristics in Top-Emission Organic Light Emitting Diode with Cr/Al/Cr Anodes
Chung Sung Mook Japanese Journal of Applied Physics, v.46, no.6A, pp.3618-3621 |
1 |
원문
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Journal
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2002 |
Electrochemical Properties of Vanadium Oxide Thin Film Deposited by R.F. Sputtering
Park Yong-Joon Solid State Ionics, v.154-155, pp.229-235 |
38 |
원문
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