Ⅳ. 연구결과 ○ 유연 광추출 시뮬레이션 기술 - 랜덤 나노구조를 전산적으로 구현. - 물질흡수계수와 미소공진효과가 복합된 광학전사모사기법 확립. ○ 유연 광추출층 기술 - 주름구조의 크기가 조절가능한 유기물질 화학적 합성 - 신규 유연고분자 소재를 저온에서 표면조도 2.3nm 이하 평탄화 달성 - 주름구조 활용하여 발광 스펙트럼왜곡 없이 62.4% 광추출 효율 향상 ○ 저온공정용 전극 기술 - 산소플라즈마 처리를 통한 그래핀의 일함수 조절 기법 확립 - 전자수송층과 그래핀 사이에 Cs2C03 삽입하여 전자주입 장벽 낮춤. ○ 유연기판 백색 OLED 기술 - 두께 0.8 mm, 효율 45lm/W 이상 달성 (@ 3000 cd/㎡) - 3cmX8cm 백색유연 OLED 소자 공정 설계 및 제작 - 고유 인광소자 적층 백색구조 설계 및 구현 ○ 유연 OLED 광원 기술 - 유연 OLED용 대면적(200 mm x 200 mm) 봉지 공정 확립 - 백색 OLED 면광원 2013 한국전자전 시현 ○ 스마트 OLED 조명 시스템 - 근접센서 장착 유연 OLED 조명 모듈, 6hit dimming 구동부 개발 - 안드로이드 태블릿 통한 무선 제어 및 실시간 센싱,구동 정보 표시 - 8ch 독립 디밍 구동 및 사용자 교감형 알고리즘 구현 - 복수 구동 무선 전력 전송 OLED 조명 기술 - 무선 전원 유연 OLED 조명 기술
Copyright Policy
ETRI KSP Copyright Policy
The materials provided on this website are subject to copyrights owned by ETRI and protected by the Copyright Act. Any reproduction, modification, or distribution, in whole or in part, requires the prior explicit approval of ETRI. However, under Article 24.2 of the Copyright Act, the materials may be freely used provided the user complies with the following terms:
The materials to be used must have attached a Korea Open Government License (KOGL) Type 4 symbol, which is similar to CC-BY-NC-ND (Creative Commons Attribution Non-Commercial No Derivatives License). Users are free to use the materials only for non-commercial purposes, provided that original works are properly cited and that no alterations, modifications, or changes to such works is made. This website may contain materials for which ETRI does not hold full copyright or for which ETRI shares copyright in conjunction with other third parties. Without explicit permission, any use of such materials without KOGL indication is strictly prohibited and will constitute an infringement of the copyright of ETRI or of the relevant copyright holders.
J. Kim et. al, "Trends in Lightweight Kernel for Many core Based High-Performance Computing", Electronics and Telecommunications Trends. Vol. 32, No. 4, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
J. Sim et.al, “the Fourth Industrial Revolution and ICT – IDX Strategy for leading the Fourth Industrial Revolution”, ETRI Insight, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
If you have any questions or concerns about these terms of use, or if you would like to request permission to use any material on this website, please feel free to contact us
KOGL Type 4:(Source Indication + Commercial Use Prohibition+Change Prohibition)
Contact ETRI, Research Information Service Section
Privacy Policy
ETRI KSP Privacy Policy
ETRI does not collect personal information from external users who access our Knowledge Sharing Platform (KSP). Unathorized automated collection of researcher information from our platform without ETRI's consent is strictly prohibited.
[Researcher Information Disclosure] ETRI publicly shares specific researcher information related to research outcomes, including the researcher's name, department, work email, and work phone number.
※ ETRI does not share employee photographs with external users without the explicit consent of the researcher. If a researcher provides consent, their photograph may be displayed on the KSP.