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Journal
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2023 |
Ferroelectric Hafnia-Based M3D FeTFTs Annealed at Extremely Low Temperatures and TCAM Cells for Computing-in-Memory Applications
조홍래 ACS Applied Materials & Interfaces, v.15, no.44, pp.51339-51349 |
12 |
원문
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Journal
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2018 |
Interface and bulk properties of Cu(In,Ga)Se 2 solar cell with a cracker-ZnS buffer layer
Lee Woo Jung Current Applied Physics, v.18, no.4, pp.405-410 |
4 |
원문
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Journal
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2017 |
A Study on N2O Direct Oxidation Process with Re-oxidation Annealing for the Improvement of Interface Properties in 4H-SiC MOS Capacitor
Doohyung Cho Journal of the Korean Physical Society, v.71, no.3, pp.150-155 |
5 |
원문
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Journal
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2017 |
Hydrazine (N2H4)-Based Surface Treatment for Interface Quality Improvement in Al2O3/AlGaN/GaN MIS-HEMT
Jung Hyunwook ECS Journal of Solid State Science and Technology, v.6, no.4, pp.184-186 |
1 |
원문
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Journal
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2016 |
Light-soaking Effects and Capacitance Profiling in Cu(In,Ga)Se2 Thin-film Solar Cells with Chemical-bath-deposited ZnS Buffer Layers
Yu Hye-Jung Physical Chemistry Chemical Physics, v.2016, no.48, pp.33211-33217 |
24 |
원문
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Journal
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2013 |
Capacitance–voltage characterization of surface-treated Al2O3/GaN metal–oxide–semiconductor structures
Bae Sung-Bum Microelectronic Engineering, v.109, pp.10-12 |
6 |
원문
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Journal
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2010 |
Temperature Dependency and Carrier Transport Mechanisms of Ti/p-Type InP Schottky Rectifiers
V. Janardhanam Journal of Alloys and Compounds, v.504, no.1, pp.146-150 |
88 |
원문
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Journal
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2009 |
Low Voltage Operation of Nonvolatile Ferroelectric Capacitors Using Poly(Vinylidene Fluoride-Trifluoroethylene) Copolymer and Thin Al2O3 Insulating Layer
Soon-Won Jung Electrochemical and Solid-State Letters, v.12, no.9, pp.H325-H328 |
12 |
원문
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Journal
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2006 |
Lifetime and Electric Characteristics of Encapsulated Organic Light-Emitting Devices
Yong Suk Yang Japanese Journal of Applied Physics, v.45, no.10A, pp.7766-7770 |
1 |
원문
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Journal
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2006 |
N2-Annealing Effects on Characteristics of Schottky-Barrier MOSFETS
Jang Moon Gyu IEEE Transactions on Electron Devices, v.53, no.8, pp.1821-1825 |
28 |
원문
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Journal
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2006 |
Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
Lim Jungwook Electrochemical and Solid-State Letters, v.9, no.1, pp.F8-F11 |
9 |
원문
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Journal
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2003 |
엑시머 레이저 에 의해 형성된 TFT 특성
Kim Yong Hae Thin Solid Films, v.440, no.1-2, pp.169-173 |
12 |
원문
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