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Conference
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2019 |
Normally-off Field Effect Transistors using fine controlled Recess under Gate Area on AlGaN/GaN Heterostructures
Kim Zin-Sig 대한전자공학회 학술 대회 (추계) 2019, pp.215-218 |
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Journal
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2015 |
Preparation and Characterization of a Triple Layered Au-PMMA-PbSe Hybrid Nanocomposite: Manipulation of PMMA Spacer Layer by Oxygen Plasma Etching
Kim Wan Joong Bulletin of the Korean Chemical Society, v.36, no.8, pp.1966-1973 |
2 |
원문
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Journal
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2015 |
Fabrication of a Large‐Area Hierarchical Structure Array by Combining Replica Molding and Atmospheric Pressure Plasma Etching
Bong Kuk Lee Advanced Materials Interfaces, v.2, no.11, pp.1-8 |
12 |
원문
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Journal
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2015 |
Fabrication of Large-Area Hierarchical Structure Array using Siliconized-Silsesquioxane as a Nanoscale Etching Barrier
Bong Kuk Lee ACS Applied Materials & Interfaces, v.7, no.24, pp.13490-13496 |
9 |
원문
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Conference
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2013 |
Sub-22 nm Silicon Template Nanofabrication by Advanced Spacer Patterning Technique for NIL Applications
Park Jong-Moon Alternative Lithographic Technologies V (SPIE 8680), pp.1-8 |
0 |
원문
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Journal
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2011 |
Effect of Deposition Conditions and Crystallinity of Substrate on Phase Transition of Hydrogenated Si Films
김준관 Journal of the Electrochemical Society, v.158, no.7, pp.D430-D434 |
7 |
원문
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Journal
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2010 |
Optimum Condition of Anisotropic Plasma Etching for Improving Bending Properties of Ionic Polymer-Metal Composites
Choi Nak Jin Journal of Nanoscience and Nanotechnology, v.10, no.5, pp.3299-3303 |
9 |
원문
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Conference
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2008 |
Optimum Condition of Anisotropic Plasma Etching for Improving Bending Properties of Ionic Polymer-Metal Composites
Choi Nak Jin International Conference on Nano Science and Nano Technology (GJ-NST) 2008, pp.1-1 |
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Journal
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2008 |
Electroactive Polymer Actuator with High Response Speed Through Anisotropic Surface Roughening by Plasma Etching
Choi Nak Jin Journal of Nanoscience and Nanotechnology, v.8, no.10, pp.5385-5388 |
22 |
원문
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Journal
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2006 |
Dry Etching of Ge2Sb2Te5 Thin Films into Nanosized Patterns Using TiN Hard Mask
Yoon Sung Min Japanese Journal of Applied Physics, v.45, no.40, pp.1080-1083 |
21 |
원문
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Journal
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2005 |
Etching Characteristics of Ge2Sb2Te5 Using High-Density Helicon Plasma for the Nonvolatile Phase-Change Memory Applications
Yoon Sung Min Japanese Journal of Applied Physics, v.44, no.24-27, pp.L869-L872 |
36 |
원문
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Conference
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2005 |
EBL Patterning of Sub-10 nm Line Using HSQ with Plasma Etching Process and Fabricating of Triple-Gate MOS Transistors with 6 nm Gate Length
Baek In Bok Silicon Nanoelectronics Workshop (SNW) 2005, pp.16-17 |
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Journal
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2002 |
An Etch-Stop Technique Using Cr2O3 Thin Film and Its Application to Silica PLC Platform Fabrication
Shin Jang Uk ETRI Journal, v.24, no.5, pp.398-400 |
8 |
원문
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Conference
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2001 |
Effects of O/sub 2//C/sub 2/F/sub 6/ plasma descum with RF cleaning on via formation in MCM-D substrate using photosensitive BCB
Ju Chull Won Electronic Components and Technology Conference (ECTC) 2001, pp.1-3 |
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원문
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