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Journal
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2017 |
Gas Molecule Sensing of Van Der Waals Tunnel Field Effect Transistors
박재성 Nanoscale, v.9, no.47, pp.18644-18650 |
34 |
원문
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Journal
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2017 |
Gas Molecule Sensing of Van Der Waals Tunnel Field Effect Transistors
Choi Hongkyw Nanoscale, v.9, no.47, pp.18644-18650 |
34 |
원문
|
|
Journal
|
2017 |
Gas Molecule Sensing of Van Der Waals Tunnel Field Effect Transistors
명노준 Nanoscale, v.9, no.47, pp.18644-18650 |
34 |
원문
|
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Journal
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2017 |
Characterization of 0.18-μm Gate Length AlGaN/GaN HEMTs on SiC Fabricated Using Two-Step Gate Recessing
Hyung Sup Yoon Journal of the Korean Physical Society, v.71, no.6, pp.360-364 |
2 |
원문
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Journal
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2015 |
DC and RF Characteristics of AlGaN/GaN HEMTs on SiC with Gate Recessed by Using ICP Etching of BCl3/Cl2
Hyung Sup Yoon Journal of the Korean Physical Society, v.67, no.4, pp.654-657 |
3 |
원문
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Journal
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2014 |
Surface Properties of ZrO2 Thin Film Under Cl2/Ar Plasma Using Angle-Resolved X-Ray Photoelectron Spectroscopy
Woo Jong Chang Japanese Journal of Applied Physics, v.53, no.8S3, pp.1-6 |
3 |
원문
|
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Journal
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2013 |
Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.14, no.4, pp.216-220 |
1 |
원문
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Journal
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2012 |
Nano-Scale Texturing of Borosilicate Glasses Using CF4-Based Plasma Discharge for Application in Thin film Solar Cells
김형수 Journal of Nanoscience and Nanotechnology, v.12, no.4, pp.3464-3468 |
4 |
원문
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Journal
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2011 |
Comparative Study of Silicon Quantum Dot Formation In-situ Grown with a Gas Mixture of SiH4+N2 and SiH4+NH3
Tae-Youb Kim Journal of the Korean Physical Society, v.59, no.2, pp.308-311 |
2 |
원문
|
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Journal
|
2011 |
Microfabrication of SiN Membrane Nanosieve Using Anisotropic Reactive Ion Etching (ARIE) with an Ar/CF4 Gas Flow
Dae-Sik Lee Journal of Nanoscience and Nanotechnology, v.11, no.5, pp.4511-4516 |
8 |
원문
|
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Journal
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2010 |
Controlled Synthesis of Monolayer Graphene Toward Transparent Flexible Conductive Film Application
Byeong-Joo Lee Nanoscale Research Letters, v.5, no.11, pp.1768-1773 |
39 |
원문
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Journal
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2010 |
Surface Characteristics of Parylene-C Films in an Inductively Coupled O2/CF4 Gas Plasma
Ham Yong-Hyun Thin Solid Films, v.518, no.22, pp.6378-6381 |
17 |
원문
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Journal
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2010 |
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
김문근 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 |
5 |
원문
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Conference
|
2009 |
Study on the Surface Characteristics of Parylene-C Films in Inductively Coupled O2/CF4 Gas Plasma
Ham Yong-Hyun International Meeting on Information Display (IMID) 2009, pp.1399-1401 |
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Journal
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2009 |
Optimization of an Amorphous In-Ga-Zn-Oxide Semiconductor for a Top-Gate Transparent Thin-Film Transistor
Cheong Woo-Seok Journal of the Korean Physical Society, v.54, no.5, pp.1879-1884 |
9 |
원문
|
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Conference
|
2008 |
Dry Etching Process for the Fabrication of Transparent InGaZnO TFTs
Yoon Sung Min International Meeting on Information Display (IMID) 2008, pp.222-225 |
0 |
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Journal
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2007 |
Fabrication of Oxide TFTs with Al2O3/ZnO Gate Stacks Patterned Using a Dry Etching Method
Yoon Sung Min Electrochemical and Solid-State Letters, v.11, no.2, pp.J15-J18 |
9 |
원문
|
|
Conference
|
2007 |
The Formation of Silicon Quantum Dots in Silicon Nitride Film based on the Gas Mixture of SiH4/N2 AND SiH4/NH3
Tae-Youb Kim International Conference on Surfaces, Coatings and Nanostructured Materials (NanoSMat) 2007, pp.322-323 |
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|
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Journal
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2006 |
Dry Etching of Ge2Sb2Te5 Thin Films into Nanosized Patterns Using TiN Hard Mask
Yoon Sung Min Japanese Journal of Applied Physics, v.45, no.40, pp.1080-1083 |
21 |
원문
|
|
Journal
|
2005 |
Etching Characteristics of Ge2Sb2Te5 Using High-Density Helicon Plasma for the Nonvolatile Phase-Change Memory Applications
Yoon Sung Min Japanese Journal of Applied Physics, v.44, no.24-27, pp.L869-L872 |
36 |
원문
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|
Journal
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2002 |
Characterization of Via Etching in CHF3/CF4 Magnetically Enhanced Reactive Ion Etching Using Neural Networks
Kwon Sung-Ku ETRI Journal, v.24, no.3, pp.211-220 |
10 |
원문
|
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Conference
|
2001 |
Effects of O/sub 2//C/sub 2/F/sub 6/ plasma descum with RF cleaning on via formation in MCM-D substrate using photosensitive BCB
Ju Chull Won Electronic Components and Technology Conference (ECTC) 2001, pp.1-3 |
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원문
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