Subject

Subjects : Inductively coupled

  • Articles (37)
  • Patents (0)
  • R&D Reports (0)
논문 검색결과
Type Year Title Cited Download
Journal 2024 Effect of inductively coupled plasma etch on the interface barrier behavior of (001) β-Ga2O3 Schottky barrier diode   Lee Hun Ki  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.42, no.4, pp.1-10 2 원문
Journal 2020 Effects of Recess Depth Under the Gate Area on the V th-Shift for Fabricating Normally-Off Field Effect Transistors on AlGaN/GaN Heterostructures   Kim Zin-Sig  Journal of Nanoscience and Nanotechnology, v.20, no.7, pp.4170-4175 원문
Conference 2019 Normally-off Field Effect Transistors using fine controlled Recess under Gate Area on AlGaN/GaN Heterostructures   Kim Zin-Sig  대한전자공학회 학술 대회 (추계) 2019, pp.215-218
Journal 2019 Effect of Inductively Coupled Plasma on Multilayer Electrodes for Flexible Single-Layer Touch Screen Panels   Hong Chan-Hwa  ACS Applied Materials & Interfaces, v.11, no.28, pp.25495-25499 3 원문
Journal 2018 Ultra-low Rate Dry Etching Conditions for Fabricating Normally-off Field Effect Transistors on AlGaN/GaN Heterostructures   Kim Zin-Sig  Solid-State Electronics, v.140, pp.12-17 9 원문
Journal 2017 Characterization of 0.18-μm Gate Length AlGaN/GaN HEMTs on SiC Fabricated Using Two-Step Gate Recessing   Hyung Sup Yoon  Journal of the Korean Physical Society, v.71, no.6, pp.360-364 2 원문
Journal 2017 Surface Nanostructuring of CuIn1_xGaxSe2 Films using Argon Plasma Treatment   S P Zimin  Semiconductor Science and Technology, v.32, no.7, pp.1-8 6 원문
Journal 2015 CCQM pilot study CCQM-P140: quantitative surface analysis of multi-element alloy films   김경중  Metrologia, v.52, no.Technical Suppl., pp.1-28 원문
Journal 2015 Effect of Inductively Coupled Plasma on the Structural and Electrical Properties of Ti-Doped ITO Films Formed by IPVD   Hong Chan-Hwa  Journal of Nanoscience and Nanotechnology, v.15, no.10, pp.8099-8102 2 원문
Journal 2015 Fabrication and Electrical Properties of an AlGaN/GaN HEMT on SiC with a Taper-Shaped Backside Via Hole   Min Byoung-Gue  Journal of the Korean Physical Society, v.67, no.4, pp.718-722 2 원문
Journal 2015 Low Temperature Fabrication of Indium-Tin Oxide Film by Using Ionized Physical Vapor Deposition Method   Cheong Woo-Seok  Surface and Coatings Technology, v.266, pp.10-13 8 원문
Journal 2014 The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process   Woo Jong Chang  Transactions on Electrical and Electronic Materials, v.15, no.1, pp.49-54 1 원문
Journal 2013 Accurate Quantification of Cu(In,Ga)Se2 Films by AES Depth Profiling Analysis   장종식  Applied Surface Science, v.282, pp.777-781 8 원문
Conference 2013 Improvement of C-Si Surface Passivation using Dual Intrinsic A-Si:H Layers for Silicon Heterojunction Solar Cells   Lee Kyu Sung  Photovoltaic Specialists Conference (PVSC) 2013, pp.1254-1256 0 원문
Journal 2013 The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma   Woo Jong Chang  Transactions on Electrical and Electronic Materials, v.14, no.2, pp.67-70
Conference 2013 Effects of Inductively Coupled Plasma on the Properties of ITO Source/Drain Electrode for ZnO-based Thin-film Transistors     MRS Meeting 2013 (Spring), pp.1-1
Conference 2013 Sub-22 nm Silicon Template Nanofabrication by Advanced Spacer Patterning Technique for NIL Applications   Park Jong-Moon  Alternative Lithographic Technologies V (SPIE 8680), pp.1-8 0 원문
Journal 2012 Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma   김대희  Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 3 원문
Conference 2012 Surface passivation for silicon heterojunction solar cells by hodrogenated amorphous silicon using inductively coupled plasma chemical vapor deposition   연창봉  Global Photovoltaic Conference (GPVC) 2012
Conference 2012 Effect of Inductively Coupled Plasma on the Electrical and Optical Properties of Indium Tin Oxide Films Deposited by Ionized Physical Vapor Deposition     Pacific Rim Meeting on Electrochemical and Solid-State Science (PRiME) 2012, pp.1-1
Journal 2012 Quantitative Analysis of Cu(In,Ga)Se2 Thin Films by Secondary Ion Mass Spectrometry Using a Total Number Counting Method   장종식  Metrologia, v.49, no.4, pp.522-529 12 원문
Journal 2012 Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas   장한별  Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 3 원문
Journal 2011 Dual Etch Processes of Via and Metal Paste Filling for Through Silicon Via Process   함용현  Thin Solid Films, v.519, no.20, pp.6727-6731 26 원문
Journal 2011 Etching characteristics and mechanism of Ga-doped ZnO thin films in inductively-coupled HBr/X (X = Ar, He, N2, O2) plasmas   함용현  Vacuum, v.85, no.11, pp.1021-1025 9 원문
Journal 2010 Surface Characteristics of Parylene-C Films in an Inductively Coupled O2/CF4 Gas Plasma   Ham Yong-Hyun  Thin Solid Films, v.518, no.22, pp.6378-6381 17 원문
Journal 2010 Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma   함용현  Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-5 5 원문
Journal 2010 Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas   김문근  Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 5 원문
Conference 2009 Study on the Surface Characteristics of Parylene-C Films in Inductively Coupled O2/CF4 Gas Plasma   Ham Yong-Hyun  International Meeting on Information Display (IMID) 2009, pp.1399-1401
Journal 2009 Kinetics of Chemical Changes in Phenol Formaldehyde Based Polymeric Films Etched in N2 O and O2 Inductively Coupled Plasmas: A Comparative Study   권광호  Japanese Journal of Applied Physics, v.48, no.8, pp.1-4 2 원문
Journal 2009 Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma   한용현  Japanese Journal of Applied Physics, v.48, no.8, pp.08HD041-08HD045 8 원문
Journal 2009 Fabrication of Silicon-Oxide Thin Film by Using Ionized Physical Vapor Deposition and Application to Gate Insulators in Transparent Thin-Film Transistors   Cheong Woo-Seok  Journal of the Korean Physical Society, v.54, no.1, pp.473-477 1 원문
Journal 2008 Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl2/X (X=Ar, He, N2) Inductively Coupled Plasmas   Alexander Efremov  Journal of the Electrochemical Society, v.155, no.12, pp.D777-D782 72 원문
Journal 2008 Etching Characteristics of Al2O3 Thin Films in Inductively Coupled BCl3/Ar Plasma   Sun Jin Yun  Vacuum, v.82, no.11, pp.1198-1202 14 원문
Journal 2008 Model-Based Analysis of the ZrO2 Etching Mechanism in Inductively Coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas   김만수  ETRI Journal, v.30, no.3, pp.383-393 10 원문
Journal 2008 Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3∕He inductively coupled plasma   김만수  Journal of Vacuum Science and Technology A, v.26, no.3, pp.344-351 14 원문
Conference 2006 RFID Tag Antenna with a Meandered Dipole and Inductively Coupled Feed   Choi Won Kyu  IEEE Antennas and Propagation Society International Symposium 2006, pp.619-622 29 원문
Journal 2005 Design of RFID Tag Antennas using an Inductively Coupled Feed   Son Hae Won  Electronics Letters, v.41, no.18, pp.994-996 217 원문
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