Journal
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2024 |
Benzylphosphonic acid treated ultra-thin ALD-InOx for long term device stability
Juhun Lee Journal of Materials Chemistry C, v.12, no.31, pp.11928-11937 |
1 |
원문
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Journal
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2023 |
Synaptic devices for simulating brain processes in visual-information perception to persisting memory through attention mechanisms
Kim Jieun MATERIALS TODAY ADVANCES, v.20, pp.1-8 |
3 |
원문
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Journal
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2023 |
Novel approach for implementing ternary value logic devices showing negative differential transconductance characteristics by Fowler–Nordheim tunneling
Kim Jieun Materials Science in Semiconductor Processing, v.164, pp.1-6 |
1 |
원문
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Journal
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2022 |
Photo-Synaptic Oxide Transistors with Al2O3/SiOx Stacked Gate Dielectric Exhibiting 1024 Conduction States with Good Linearity
Lim Jungwook Advanced Electronic Materials, v.8, no.10, pp.1-5 |
6 |
원문
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Journal
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2022 |
Effects of DC and AC Stress on the VT Shift of AlGaN/GaN MIS-HEMTs
Kang Soo Cheol Current Applied Physics, v.39, pp.128-132 |
0 |
원문
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Journal
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2021 |
Photoinduced Synaptic Behavior of InxTiyO Thin Film Transistors
Lim Jungwook Advanced Electronic Materials, v.7, no.4, pp.1-7 |
10 |
원문
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Conference
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2020 |
Structural Design and Simulation of MOS Controlled Thyristor with 0V Turn-off Capability
Sungkyu Kwon 대한전자공학회 학술 대회 (추계) 2020, pp.157-160 |
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Journal
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2020 |
Electrochromic Infrared Light Modulation in Optical Waveguides
Jin Tae Kim Advanced Optical Materials, v.8, no.1, pp.1-8 |
12 |
원문
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Journal
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2018 |
Facile Fabrication of Self-assembled ZnO Nanowire Network Channels and Its Gate-controlled UV Detection
장호찬 Nanoscale Research Letters, v.13, pp.1-9 |
13 |
원문
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Journal
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2018 |
High Performance Self-gating Graphene/MoS2 Diode Enabled by Asymmetric Contacts
무하마드칸 Nanotechnology, v.29, no.39, pp.1-6 |
7 |
원문
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Journal
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2014 |
Low-Voltage-Operated Organic One-Time Programmable Memory Using Printed Organic Thin-Film Transistors and Antifuse Capacitors
Soon-Won Jung Journal of Nanoscience and Nanotechnology, v.14, no.11, pp.8167-8170 |
3 |
원문
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Journal
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2014 |
Organic Field Effect Transistors Based on Graphene and Hexagonal Boron Nitride Heterostructures
이관형 Advanced Functional Materials, v.24, no.32, pp.5157-5163 |
71 |
원문
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Journal
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2014 |
Organic Field Effect Transistors Based on Graphene and Hexagonal Boron Nitride Heterostructures
Yu Young-Jun Advanced Functional Materials, v.24, no.32, pp.5157-5163 |
71 |
원문
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Journal
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2014 |
Organic Field Effect Transistors Based on Graphene and Hexagonal Boron Nitride Heterostructures
강석주 Advanced Functional Materials, v.24, no.32, pp.5157-5163 |
71 |
원문
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Journal
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2014 |
Normally-Off Dual Gate AlGaN/GaN MISFET with Selective Area-Recessed Floating Gate
Hokyun Ahn Solid-State Electronics, v.95, pp.42-45 |
18 |
원문
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Journal
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2013 |
Analysis of Failure in Miniature X‐ray Tubes with Gated Carbon Nanotube Field Emitters
Kang Jun Tae ETRI Journal, v.35, no.6, pp.1164-1167 |
18 |
원문
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Journal
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2013 |
Comparative studies on electrical bias temperature instabilities of In–Ga–Zn–O thin film transistors with different device configurations
Ryu Min Ki Solid-State Electronics, v.89, pp.171-176 |
21 |
원문
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Journal
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2013 |
Flexible and Transparent MoS2 Field-Effect Transistors on Hexagonal Boron Nitride-Graphene Heterostructures
이관형 ACS Nano, v.7, no.9, pp.7931-7936 |
1014 |
원문
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Journal
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2013 |
Nonvolatile Ferroelectric P(VDF-TrFE) Memory Transistors Based on Inkjet-Printed Organic Semiconductor
Soon-Won Jung ETRI Journal, v.35, no.4, pp.734-737 |
18 |
원문
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Journal
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2013 |
Electrical Characteristics of Triple-Gate RSO Power MOSFET (TGRMOS) with Various Gate Configurations and Bias Conditions
Na Kyoung Il ETRI Journal, v.35, no.3, pp.425-430 |
4 |
원문
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Conference
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2013 |
Effects of Various Field Plates for Normally-Off GaN MISFETs
Woojin Chang International Technical Conference on Circuits/Systems, Computers and Communications (ITC-CSCC) 2013, pp.332-333 |
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Conference
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2013 |
Simulation Studies of Triple Gate Trench Power MOSFETs (TGRMOSs) by Using Modified Resurf Stepped Oxide (RSO) Process with Various Gate Configuration and its Bias Condition
Na Kyoung Il 한국 반도체 학술 대회 (KCS) 2013, pp.1-2 |
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Conference
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2012 |
Highly Efficient Doherty Amplifier with Peaking Cell Controlled Using Optimized Shaped Gate Voltage
김준형 International Microwave Symposium (IMS) 2012, pp.1-3 |
1 |
원문
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Journal
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2012 |
Subthreshold Characteristics of Pentacene Field-Effect Transistors Influenced by Grain Boundaries
Park Jae Hoon Journal of Applied Physics, v.111, no.10, pp.1-6 |
12 |
원문
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Conference
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2011 |
High-transmission Triode CNT Emitter on Metal Tip for Super-miniature X-ray Tube
Kang Jun Tae International Vacuum Nanoelectronics Conference (IVNC) 2011, pp.145-146 |
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Journal
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2011 |
Low-voltage-operated Top-gate Polymer Thin-film Transistors with High-capacitance P(VDF-TrFE)/PVDF-blended Dielectrics
Soon-Won Jung Current Applied Physics, v.11, no.3 Suppl., pp.S213-S218 |
44 |
원문
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Journal
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2011 |
“See-Through” Nonvolatile Memory Thin-Film Transistors Using a Ferroelectric Copolymer Gate Insulator and an Oxide Semiconductor Channel
Yoon Sung Min Journal of the Korean Physical Society, v.58, no.5, pp.1494-1499 |
2 |
원문
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Journal
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2010 |
Low-Voltage-Operated Top-Gate Polymer Thin-Film Transistors with high Capacitance Poly(Vinylidene Fluoride-Trifluoroethylene)/Poly(Methyl Methacrylate) Dielectrics
Soon-Won Jung Journal of Applied Physics, v.108, no.10 |
45 |
원문
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Journal
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2010 |
Modified Ion Sensitive Field Effect Transistor Sensors having an Extended Gate on a Thick Dielectric
Chang-Geun Ahn Applied Physics Letters, v.96, no.20, pp.1-3 |
5 |
원문
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Journal
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2010 |
Fully Transparent Non‐volatile Memory Thin‐Film Transistors Using an Organic Ferroelectric and Oxide Semiconductor Below 200 °C
Yoon Sung Min Advanced Functional Materials, v.20, no.6, pp.921-926 |
108 |
원문
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Journal
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2009 |
Effects of ZnO Channel Thickness on the Device Behaviour of Nonvoltile Memory Thin Film Transistor with Double-layered Gate Insulators of Al2O3 and Ferroelectric Polymer
Yoon Sung Min Journal of Physics D : Applied Physics, v.42, no.24, pp.1-6 |
32 |
원문
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Journal
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2009 |
Impact of Sn/Zn Ratio on the Gate Bias and Temperature-Induced Instability of Zn-In-Sn-O thin Film Transistors
Ryu Min Ki Applied Physics Letters, v.95, no.17, pp.173508-1-173508-3 |
105 |
원문
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Conference
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2009 |
Modified ISFETs Having an Extended Gate on the Thick Dielectric
Chang-Geun Ahn SENSORS 2009, pp.371-374 |
0 |
원문
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Journal
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2009 |
Low-Frequency Noise in Amorphous Indium–Gallium–Zinc-Oxide Thin-Film Transistors
이정민 IEEE Electron Device Letters, v.30, no.5, pp.505-507 |
61 |
원문
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Journal
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2009 |
Fabrication of Silicon-Oxide Thin Film by Using Ionized Physical Vapor Deposition and Application to Gate Insulators in Transparent Thin-Film Transistors
Cheong Woo-Seok Journal of the Korean Physical Society, v.54, no.1, pp.473-477 |
1 |
원문
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Journal
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2009 |
Charge Storage Effect on In2O3 Nanowires with Ruthenium Complex Molecules
Choi Insung Applied Physics Express, v.2, no.1, pp.1-3 |
0 |
원문
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Journal
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2008 |
Electrostatic Modification of Infrared Response in Gated Structures based on VO2
M. M. Qazilbash Applied Physics Letters, v.92, no.24, pp.1-3 |
65 |
원문
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Journal
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2007 |
Hysteresis and Threshold Voltage Shift of Pentacene Thin-film Transistors and Inverters with Al2O3 Gate Dielectric
Koo Jae Bon Applied Physics Letters, v.90, no.13, pp.1-3 |
58 |
원문
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Journal
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2006 |
Ambipolar Carrier Injection Characteristics of Erbium-Silicided n-Type Schottky Barrier Metal–Oxide–Semiconductor Field-Effect Transistors
Jang Moon Gyu Japanese Journal of Applied Physics, v.45, no.2A, pp.730-732 |
32 |
원문
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Journal
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2005 |
New Method of Driving an OLED with an OTFT
Lim Sang Chul Synthetic Metals, v.151, no.3, pp.197-201 |
18 |
원문
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Journal
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2005 |
SOI single-electron transistor with low RC delay for logic cells and SET/FET hybrid ICs
Kim Dong Kyu IEEE Transactions on Nanotechnology, v.4, no.2, pp.242-248 |
42 |
원문
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Journal
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2003 |
Erbium silicided n-type Schottky barrier tunnel transistors for nanometer regime applications
Jang Moon Gyu IEEE Transactions on Nanotechnology, v.2, no.4, pp.205-209 |
16 |
원문
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Journal
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2003 |
엑시머 레이저 에 의해 형성된 TFT 특성
Kim Yong Hae Thin Solid Films, v.440, no.1-2, pp.169-173 |
12 |
원문
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Journal
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2003 |
A novel technique for fabricating high reliable trench DMOSFETs using self-align technique and hydrogen annealing
Kim Jongdae IEEE Transactions on Electron Devices, v.50, no.2, pp.378-383 |
5 |
원문
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