Journal
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2022 |
Characteristics of PEALD–Hafnium Dioxide Films and their Application to Gate Insulator Stacks of Photosynaptic Transistors
Kim Jieun Advanced Electronic Materials, v.8, no.4, pp.1-8 |
6 |
원문
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Journal
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2021 |
Organic/Inorganic Hybrid Thin-Film Encapsulation Using Inkjet Printing and PEALD for Industrial Large-Area Process Suitability and Flexible OLED Application
Kwon Byoung-Hwa ACS Applied Materials & Interfaces, v.13, no.46, pp.54621-55766 |
36 |
원문
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Journal
|
2021 |
Effects of Moisture-Proof Back Passivation Layers of Al2O3 and AlxTi1-xOy Films on Efficiency Improvement and Color Modulation in Transparent a-Si:H Solar Cells
Kim Jieun ACS Applied Materials & Interfaces, v.13, no.4, pp.4968-4974 |
13 |
원문
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Journal
|
2019 |
All-oxide Thin-film Transistors with Channels of Mixed InOx-ZnOy Formed by Plasma-enhanced Atomic Layer Deposition Process
Lee Jeongmu Journal of Vacuum Science and Technology A, v.37, no.6, pp.1-7 |
11 |
원문
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Journal
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2016 |
Improved stability of electrical properties of nitrogen-added Al 2 O 3 films grown by PEALD as gate dielectric
Lee Da Jung Materials Research Bulletin, v.83, pp.597-602 |
10 |
원문
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Conference
|
2016 |
Oxide Vertical TFTs for the Application to the Ultra High Resolution Display
염혜인 Society for Information Display (SID) International Symposium 2016, pp.820-822 |
34 |
원문
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Conference
|
2015 |
The Effect of Annealing Treatment on Indium Oxide/Zinc Oxide Heterostructured Thin Films Transistors Grown by Plasma Enhanced Atomic Layer Deposition
Lee Hwanjae International Conference on Advanced Materials and Devices (ICAMD) 2015, pp.1-1 |
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Conference
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2015 |
A Study on the Physical and Electrical Properties of Indium Oxide/Zinc Oxide Heterostructured Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition
Lee Jeongmu International Conference on Advanced Materials and Devices (ICAMD) 2015, pp.1-1 |
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Conference
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2015 |
The Effect of Post-Annealing on Bias Stability of InOx/ZnO Superlattice Thin Film Transistors Grown by Plasma Enhanced Atomic Layer Deposition
Lee Hwanjae Asian-European International Conference on Plasma Surface Engineering (AEPSE) 2015, pp.1-1 |
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Conference
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2015 |
Growth Characteristics and Electrical Properties of Indium Oxide and Zinc Oxide Superlattice Thin Films by Plasma Enhanced Atomic Layer Deposition
Lee Jeongmu Asian-European International Conference on Plasma Surface Engineering (AEPSE) 2015, pp.1-1 |
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Journal
|
2010 |
Fabrication of Self-Aligned TFTs with a Ultra-Low Temperature Polycrystalline Silicon Process on Metal Foils
Jaehyun Moon Solid-State Electronics, v.54, no.11, pp.1326-1331 |
2 |
원문
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Journal
|
2010 |
A Low-Temperature-Grown TiO2-Based Device for the Flexible Stacked RRAM Application
Hu Young Jeong Nanotechnology, v.21, no.11, pp.1-6 |
132 |
원문
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Journal
|
2010 |
Optical and Electrical Properties of AlxTi1-xO Films
Lim Jungwook Journal of the Korean Physical Society, v.56, no.1, pp.96-99 |
3 |
원문
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Journal
|
2010 |
Bipolar Resistive Switching in Amorphous Titanium Oxide Thin Film
Hu Young Jeong Physica Status Solidi (RRL), v.4, no.1-2, pp.1-3 |
60 |
원문
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Conference
|
2009 |
Electrical and Optical Properties of AlTiO Films
Lim Jungwook 한국반도체 학술 대회 (KCS) 2009, pp.1-2 |
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Journal
|
2008 |
Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition
Lim Jungwook Japanese Journal of Applied Physics, v.47, no.8, pp.6934-6937 |
10 |
원문
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Journal
|
2008 |
Vanadium Dioxide Films Deposited on Amorphous SiO2- and Al2O3-Coated Si Substrates by Reactive RF-Magnetron Sputter Deposition
Sun Jin Yun Japanese Journal of Applied Physics, v.47, no.4, pp.3067-3069 |
22 |
원문
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Journal
|
2007 |
Characteristics of Al[sub x]Ti[sub 1−x]O[sub y] Films Grown by Plasma-Enhanced Atomic Layer Deposition
Lim Jungwook Journal of the Electrochemical Society, v.154, no.11, pp.G239-G243 |
25 |
원문
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Journal
|
2007 |
PEALD 방법으로 증착한 ZrO2/Al2O3 nano-compoiste 박막의 특성
Sun Jin Yun Journal of Nanoscience and Nanotechnology, v.7, no.11, pp.4180-4184 |
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Journal
|
2007 |
Characteristics of Pentacene Thin Film Transistor with Al2O3 Gate Dielectrics on Plastic Substrate
Lim Jungwook Electrochemical and Solid-State Letters, v.10, no.10, pp.J36-J38 |
8 |
원문
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Journal
|
2007 |
Stress Reduction of Ge2Sb2Te5 Crystallization by Capping Al2O3 Film Grown by PEALD
Park Young Sam ECS Transactions, v.11, no.7, pp.245-248 |
2 |
원문
|
Conference
|
2007 |
P‐18: Improvement of Stability in ZnO TFT Under Bias Stress
Hwang Chi-Sun Society for Information Display (SID) International Symposium 2007, pp.237-240 |
6 |
원문
|
Journal
|
2007 |
Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
Sun Jin Yun Electrochemical and Solid-State Letters, v.10, no.3, pp.H90-H93 |
11 |
원문
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Conference
|
2006 |
High-K Nano-Composite ZrO2/Al2O3 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
Sun Jin Yun International Conference on Nano Science and Nano Technology (GJ-NST) 2009, pp.1-25 |
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Journal
|
2006 |
Performance Improvement of Ultralow Temperature Polycrystalline Silicon TFT on Plastic Substrate by Plasma Oxidation of Polycrystalline Si Surface
Kim Yong Hae IEEE Electron Device Letters, v.27, no.11, pp.896-898 |
10 |
원문
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Conference
|
2006 |
Characteristics of ZrAlO Films Deposited by Plasma Enhanced Atomic Layer Deposition
Sun Jin Yun The Electrochemical Society (ECS) Meeting 2006, pp.1-2 |
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Conference
|
2006 |
Transparent ZnO Transistor Array by Means of Plasma Enhanced Atomic Layer Deposition
Park Sang-Hee International Meeting on Information Display 2006, pp.601-604 |
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Conference
|
2006 |
Plasma Oxidation Effect on Ultralow Temperature Polycrystalline Silicon TFT on Plastic Substrate
Kim Yong Hae International Meeting on Information Display 2006, pp.1122-1125 |
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Conference
|
2006 |
Plasma Enhanced Atomic Layer Deposition of Vanadium Oxide using Tetrakis(Ethylmethylamino) Vanadium and O2 as Precursors
Sun Jin Yun International Conference on Atomic Layer Deposition Workshop (ALD) 2006, pp.1-1 |
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Conference
|
2006 |
Plasma-Enhanced Atomic Layer Deposition of ZrO2 film and the Performance of Pentacene thin film Transistor with ZrO2 Gate Dielectric Layer
Sun Jin Yun International Conference on Atomic Layer Deposition Workshop (ALD) 2006, pp.1-1 |
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Conference
|
2006 |
Switching Mechanism of TiO2 thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
Ryu Min Ki MRS Meeting 2006 (Spring), pp.1-1 |
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Conference
|
2006 |
Self-Aligned Thin Film Transistor Fabrication with an Ultra Low Temperature Polycrystalline Silicon Process on a Benzocyclobutene Planarized Stainless Steel Foil Substrate
Jaehyun Moon Materials Research Society (MRS) Meeting 2006 (Spring), pp.1-6 |
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Conference
|
2006 |
Plasma-Enhanced Atomic Layer Deposition 기술을 이용한 ZrOB 2B 박막 증착 공정에서 증착 온도와 Plasma Pulse Width가 박막 특성에 미치는 효과
Sun Jin Yun 한국반도체 학술 대회 (KCS) 2006, pp.1-2 |
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Journal
|
2006 |
Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
Lim Jungwook Electrochemical and Solid-State Letters, v.9, no.1, pp.F8-F11 |
9 |
원문
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Journal
|
2005 |
Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
Sun Jin Yun Electrochemical and Solid-State Letters, v.8, no.11, pp.F47-F50 |
27 |
원문
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Conference
|
2005 |
Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
Park Sang-Hee ECS Transactions, pp.125-130 |
2 |
원문
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Journal
|
2005 |
Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
Lim Jungwook Electrochemical and Solid-State Letters, v.8, no.9, pp.F25-F28 |
16 |
원문
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Journal
|
2005 |
Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
Lim Jungwook ETRI Journal, v.27, no.1, pp.118-121 |
68 |
원문
|
Journal
|
2004 |
고성능 저온 폴리실리콘 소자 특성
Kim Yong Hae IEEE Electron Device Letters, v.25, no.8, pp.550-552 |
27 |
원문
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